Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/76731
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dc.contributor.authorXu, J.-
dc.contributor.authorLai, D.-
dc.contributor.authorWu, J.-
dc.contributor.authorXie, Z.-
dc.contributor.authorMunroe, P.-
dc.date.issued2012-
dc.identifier.citationSurface and Coatings Technology, 2012; 206(23):4947-4951-
dc.identifier.issn0257-8972-
dc.identifier.urihttp://hdl.handle.net/2440/76731-
dc.description.abstractNanocrystalline C40-structured (Mo 1-xCr x)Si 2 films were engineered onto Ti6Al4V substrates by a double glow discharge plasma technique. The electrochemical behavior of the newly developed films in a 3.5wt.% NaCl solution was characterized by electrochemical techniques including open circuit potential, potentiodynamic polarization, and electrochemical impedance spectroscopy. To gain a deeper understanding of the role of Cr alloying in corrosion resistance, both cohesive energy and Mulliken population of the interatomic bonds in C40 (Mo 1-xCr x)Si 2 were calculated based on the first-principles density-functional theory. © 2012.-
dc.description.statementofresponsibilityJiang Xu, Daohui Lai, Jiadi Wu, Zonghan Xie, Paul Munroe-
dc.language.isoen-
dc.publisherElsevier Science SA-
dc.rightsCopyright © 2012 Published by Elsevier B.V.-
dc.source.urihttp://dx.doi.org/10.1016/j.surfcoat.2012.05.116-
dc.subjectTransition metal silicides-
dc.subjectFirst-principle calculation-
dc.subjectCorrosion-
dc.subjectThin films-
dc.titleEnhanced corrosion-resistance in nanocrystalline MoSi₂ films enabled by Cr additions-
dc.title.alternativeEnhanced corrosion-resistance in nanocrystalline MoSi(2) films enabled by Cr additions-
dc.typeJournal article-
dc.identifier.doi10.1016/j.surfcoat.2012.05.116-
pubs.publication-statusPublished-
Appears in Collections:Aurora harvest 4
Materials Research Group publications
Mechanical Engineering publications

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