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https://hdl.handle.net/2440/875
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Type: | Journal article |
Title: | Primary reaction channels and kinetics of the thermal decomposition of phenylsilane |
Author: | O'Neal, H. Ring, M. Kim, D. King, K. |
Citation: | The Journal of physical chemistry, 1995; 99(23):9397-9402 |
Publisher: | American Chemical Society |
Issue Date: | 1995 |
ISSN: | 0022-3654 1541-5740 |
Abstract: | The thermally induced decomposition of phenylsilane has been investigated by three different experimental methods: a static method, a comparative rate-single pulse shock tube (CR-SPST) method, and a very low-pressure pyrolysis (VLPP) method. Decomposition is mainly heterogeneous under static conditions but appears homogeneous in the other two systems. Homogeneous dissociations occur by two channels with yields, PhSiH3 →1 H2 + PhSiH, φ1 ∼ 0.84 ± 0.04; PhSiH3 →2 PhH + SiH2, φ2 ∼ 0.16 ± 0.04. Coupling of CR-SPST and homogeneous static reactor data spanning temperatures from 693 to 1236 K for the benzene formation channel and adjusting for falloff by RRKM methods gives high-pressure Arrhenius parameters of A1 = 1014.0±0.4, E1= 59.3 ± 2.1 and A2 = 1013.9±0.2, E2 = 62.0 ± 0.9 (A in s-1 and E in kcal/mol) for the two primary dissociation channels. These parameters yield RRKM calculated rate constants under VLPP conditions which agree within the errors with experimental rate constants. © 1995 American Chemical Society. |
DOI: | 10.1021/j100023a015 |
Published version: | http://dx.doi.org/10.1021/j100023a015 |
Appears in Collections: | Aurora harvest 2 Chemical Engineering publications |
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